semiconductor, biostatistics, aeronautics, automotive, pharmaceutical, nuclear and space industry ...
Company
Ippon Innovation, headquartered in Toulouse, France, was created by François Bergeret, PhD in statistics from the University of Toulouse, who held various positions in R&D, production and quality for 15 years with Motorola and Freescale (now NXP). Ippon has very strong links with Galaxy Semiconductor, which industrializes and markets solutions for microelectronics.
Ippon Innovation is now a team of high level Data Scientists working in semiconductor, medical, aerospace, food industry... For example, solutions for process & yield optimization and outliers detection are developed.
Ippon Innovation is now with Galaxy, which markets and industrializes our advanced solutions in microelectronics.
Ippon Learning also proposes training and consulting in Lean Six Sigma(Black Belt, Green Belt), Statistics (DOE, SPC, modeling, data science...), Quality Methods (FMEA, Problem Solving...), Metrology (ISO17020, ISO17025...).
For R&D, Ippon Innovation collaborates with Toulouse University, INSA (applied mathematics) and also with the Midi Pyrénées Region and the European Union.
As JMP business partner ( www.jmp.com), Ippon Innovation and Ippon Learning have developed a strong expertise with JMP software including: advanced scripting, consulting and training.
Some customers:
Solutions
Ippon proposes innovative solutions to improve the reliability of your products,yield, process and cost of test.
For High
Reliability GAT is in production for our semiconductor and pharmaceutical customers.
Reliability GAT is in production for our semiconductor and pharmaceutical customers.
GAT objective is to select anomalies by techniques of outlier ensembles.
GAT is designed for data of any dimension, including low sample size and high dimension (HDLSS).
GAT includes a double unsupervised algorithm to identify outlier items and can be applied in various fields.
Developed in partnership with Toulouse university, GAT is the ultimate zero defect tool.
To improve processes & yield
YETI is a software that finds root causes of issues in complex processes.
It is based on a set of statistical analyses adapted to any kind of parameters.
Yield has been improved by several percents in semiconductor manufacturing and drug quality has been improved in pharmaceutical industry with YETI.
To detect abnormal signal
CHAM is used by a major energy company
CHAM is a solution developed by ippon innovation to detect anomalies on sensors curves, process or metrology tool parameters or any weak signal.
Statistical analysis is applied on temporal curves, multiple parameters or any simple or complex signal, in particular images.
Learning
Statistics
Statistics and Modeling
Data Science
Outlier Detection
Design of Experiments
Statistical Process Control
JMP Fundamentals
Lean Six Sigma and Metrology
Green Belt and Black Belt with certification IASSC
Design For Six Sigma - DFSS
Measurement System Analysis and Metrology
Metrology norms: ISO 17020, ISO 17025
Statistics and ModelingData ScienceOutlier DetectionDesign of ExperimentsStatistical Process ControlJMP FundamentalsLean Six Sigma and Metrology
Green Belt and Black Belt with certification IASSCDesign For Six Sigma - DFSSMeasurement System Analysis and MetrologyMetrology norms: ISO 17020, ISO 17025
Ippon Learning proposes a large set of trainings,
standard or customized, in class or e-learning based.
standard or customized, in class or e-learning based.
For more information on trainings, please contact us.
NEWS
Information, news from Ippon
Previous
Next
ORPHELIA paper
Publication in Pharmaceutics by our Customer ORPHELIA of two scientific articles about the first pediatric drinkable formulation of temozolomide developed for the treatment of neuroblastoma. Ippon did the statistical work.
12.02.2024
CHAM patent
The patent for our CHAM method for detecting multivariate outliers on functional data was obtained in France. International extensions in progress.
12.02.2024
reliability
2 ippon’s statisticians are co-authors at the ESREF conference and in the Microelectronics Reliability journal "New reliability model for power SiC MOSFET technologies under static and dynamic gate stress" with IRT Saint Exupery.